An interface study of indium tin oxide on Polyethylene Terephthalate with Nickel Phthalocyanine by photoelectron spectroscopies: The effect of cleaning pretreatment
Identifieur interne : 002035 ( Main/Repository ); précédent : 002034; suivant : 002036An interface study of indium tin oxide on Polyethylene Terephthalate with Nickel Phthalocyanine by photoelectron spectroscopies: The effect of cleaning pretreatment
Auteurs : RBID : Pascal:12-0054343Descripteurs français
- Pascal (Inist)
- Addition étain, Spectrométrie photoélectron, Spectre photoélectron, Nettoyage surface, Prétraitement chimique, Traitement chimique, Dépôt pulvérisation, Traitement thermique, Spectre photoélectron UV, Spectre photoélectron RX, Ultravide, Ultra haute tension, Etat électronique interface, Couche adsorbée, Dipôle, Niveau énergie, Contamination superficielle, Interface, Oxyde d'indium, Ethylène téréphtalate polymère, Phtalocyanine métallique, Argon, Complexe de nickel, Méthanol, Peroxyde d'hydrogène, Carbone, Verre, Matériau dopé, Fabrication microélectronique, 7960J, 8105K, 8540H, ITO, H2O2.
- Wicri :
English descriptors
- KwdEn :
- Adsorbed layers, Argon, Carbon, Chemical pretreatment, Chemical treatment, Dipoles, Doped materials, Energy levels, Ethylene terephthalate polymer, Glass, Heat treatments, Hydrogen peroxide, Indium oxide, Interface electron state, Interfaces, Metallophthalocyanine, Methanol, Microelectronic fabrication, Nickel complexes, Photoelectron spectra, Photoelectron spectroscopy, Sputter deposition, Surface cleaning, Surface contamination, Tin additions, Ultrahigh vacuum, Ultrahigh voltage, Ultraviolet photoelectron spectra, X-ray photoelectron spectra.
Abstract
In this work the effect of the chemical treatment, argon sputtering and heating on the surface of indium tin oxide (ITO) on a Polyethylene Terephthalate (PET) substrate as well as the influence of the surface chemical pretreatment on the interface formation with Nickel Phthalocyanine (NiPc) was studied. The sample was characterized by X-ray and ultraviolet photoelectron spectroscopies (XPS, UPS) for the as-received specimen, after chemical treated ex-situ by a solution of methanol, isopropanol, H2O and by a H2O-H2O2-NH4OH solution. In addition, it was heated up to 110 °C and after a mild argon sputtering in ultra high vacuum (UHV). The electronic structure of the interface of Nickel Phthalocyanine with ITO/PET, which has been chemically treated, was investigated. The results show that the adsorbed carbon layer affects the interface energetics. No dipole formation was observed and the alignment of the energy levels at the interface is approaching the Schottky-Mott limit. They are compared with a previous study concerning the Nickel Phthalocyanine interfaced with sputtered clean ITO surface on glass.
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<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en" level="a">An interface study of indium tin oxide on Polyethylene Terephthalate with Nickel Phthalocyanine by photoelectron spectroscopies: The effect of cleaning pretreatment</title><author><name sortKey="Tsikritzis, Dimitris" uniqKey="Tsikritzis D">Dimitris Tsikritzis</name><affiliation wicri:level="1"><inist:fA14 i1="01"><s1>Department of Chemical Engineering, University of Patras and FORTH/ICE-HT</s1><s2>26504 Patras</s2><s3>GRC</s3><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ></inist:fA14><country>Grèce</country><wicri:noRegion>26504 Patras</wicri:noRegion></affiliation></author><author><name sortKey="Petraki, Fotini" uniqKey="Petraki F">Fotini Petraki</name><affiliation wicri:level="1"><inist:fA14 i1="01"><s1>Department of Chemical Engineering, University of Patras and FORTH/ICE-HT</s1><s2>26504 Patras</s2><s3>GRC</s3><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ></inist:fA14><country>Grèce</country><wicri:noRegion>26504 Patras</wicri:noRegion></affiliation></author><author><name sortKey="Kennou, Stella" uniqKey="Kennou S">Stella Kennou</name><affiliation wicri:level="1"><inist:fA14 i1="01"><s1>Department of Chemical Engineering, University of Patras and FORTH/ICE-HT</s1><s2>26504 Patras</s2><s3>GRC</s3><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ></inist:fA14><country>Grèce</country><wicri:noRegion>26504 Patras</wicri:noRegion></affiliation></author></titleStmt><publicationStmt><idno type="inist">12-0054343</idno><date when="2012">2012</date><idno type="stanalyst">PASCAL 12-0054343 INIST</idno><idno type="RBID">Pascal:12-0054343</idno><idno type="wicri:Area/Main/Corpus">002337</idno><idno type="wicri:Area/Main/Repository">002035</idno></publicationStmt><seriesStmt><idno type="ISSN">0167-9317</idno><title level="j" type="abbreviated">Microelectron. eng.</title><title level="j" type="main">Microelectronic engineering</title></seriesStmt></fileDesc><profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Adsorbed layers</term><term>Argon</term><term>Carbon</term><term>Chemical pretreatment</term><term>Chemical treatment</term><term>Dipoles</term><term>Doped materials</term><term>Energy levels</term><term>Ethylene terephthalate polymer</term><term>Glass</term><term>Heat treatments</term><term>Hydrogen peroxide</term><term>Indium oxide</term><term>Interface electron state</term><term>Interfaces</term><term>Metallophthalocyanine</term><term>Methanol</term><term>Microelectronic fabrication</term><term>Nickel complexes</term><term>Photoelectron spectra</term><term>Photoelectron spectroscopy</term><term>Sputter deposition</term><term>Surface cleaning</term><term>Surface contamination</term><term>Tin additions</term><term>Ultrahigh vacuum</term><term>Ultrahigh voltage</term><term>Ultraviolet photoelectron spectra</term><term>X-ray photoelectron spectra</term></keywords><keywords scheme="Pascal" xml:lang="fr"><term>Addition étain</term><term>Spectrométrie photoélectron</term><term>Spectre photoélectron</term><term>Nettoyage surface</term><term>Prétraitement chimique</term><term>Traitement chimique</term><term>Dépôt pulvérisation</term><term>Traitement thermique</term><term>Spectre photoélectron UV</term><term>Spectre photoélectron RX</term><term>Ultravide</term><term>Ultra haute tension</term><term>Etat électronique interface</term><term>Couche adsorbée</term><term>Dipôle</term><term>Niveau énergie</term><term>Contamination superficielle</term><term>Interface</term><term>Oxyde d'indium</term><term>Ethylène téréphtalate polymère</term><term>Phtalocyanine métallique</term><term>Argon</term><term>Complexe de nickel</term><term>Méthanol</term><term>Peroxyde d'hydrogène</term><term>Carbone</term><term>Verre</term><term>Matériau dopé</term><term>Fabrication microélectronique</term><term>7960J</term><term>8105K</term><term>8540H</term><term>ITO</term><term>H2O2</term></keywords><keywords scheme="Wicri" type="concept" xml:lang="fr"><term>Méthanol</term><term>Carbone</term><term>Verre</term></keywords></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">In this work the effect of the chemical treatment, argon sputtering and heating on the surface of indium tin oxide (ITO) on a Polyethylene Terephthalate (PET) substrate as well as the influence of the surface chemical pretreatment on the interface formation with Nickel Phthalocyanine (NiPc) was studied. The sample was characterized by X-ray and ultraviolet photoelectron spectroscopies (XPS, UPS) for the as-received specimen, after chemical treated ex-situ by a solution of methanol, isopropanol, H<sub>2</sub>O and by a H<sub>2</sub>O-H<sub>2</sub>O<sub>2</sub>-NH<sub>4</sub>OH solution. In addition, it was heated up to 110 °C and after a mild argon sputtering in ultra high vacuum (UHV). The electronic structure of the interface of Nickel Phthalocyanine with ITO/PET, which has been chemically treated, was investigated. The results show that the adsorbed carbon layer affects the interface energetics. No dipole formation was observed and the alignment of the energy levels at the interface is approaching the Schottky-Mott limit. They are compared with a previous study concerning the Nickel Phthalocyanine interfaced with sputtered clean ITO surface on glass.</div></front></TEI><inist><standard h6="B"><pA><fA01 i1="01" i2="1"><s0>0167-9317</s0></fA01><fA02 i1="01"><s0>MIENEF</s0></fA02><fA03 i2="1"><s0>Microelectron. eng.</s0></fA03><fA05><s2>90</s2></fA05><fA06><s2>Feb</s2></fA06><fA08 i1="01" i2="1" l="ENG"><s1>An interface study of indium tin oxide on Polyethylene Terephthalate with Nickel Phthalocyanine by photoelectron spectroscopies: The effect of cleaning pretreatment</s1></fA08><fA09 i1="01" i2="1" l="ENG"><s1>Micro&Nano 2010: 4th International Conference on Micro-Nanoelectronics, Nanotechnologies & MEMs December 12-15, 2010, NCSR Demokritos, Athens, Greece</s1></fA09><fA11 i1="01" i2="1"><s1>TSIKRITZIS (Dimitris)</s1></fA11><fA11 i1="02" i2="1"><s1>PETRAKI (Fotini)</s1></fA11><fA11 i1="03" i2="1"><s1>KENNOU (Stella)</s1></fA11><fA12 i1="01" i2="1"><s1>NASSIOPOULOU (Androula G.)</s1><s9>ed.</s9></fA12><fA14 i1="01"><s1>Department of Chemical Engineering, University of Patras and FORTH/ICE-HT</s1><s2>26504 Patras</s2><s3>GRC</s3><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ></fA14><fA15 i1="01"><s1>NCSR Demokritos, Institute of Microelectronics (IMEL)</s1><s3>GRC</s3><sZ>1 aut.</sZ></fA15><fA20><s1>66-68</s1></fA20><fA21><s1>2012</s1></fA21><fA23 i1="01"><s0>ENG</s0></fA23><fA43 i1="01"><s1>INIST</s1><s2>20003</s2><s5>354000506062850180</s5></fA43><fA44><s0>0000</s0><s1>© 2012 INIST-CNRS. All rights reserved.</s1></fA44><fA45><s0>14 ref.</s0></fA45><fA47 i1="01" i2="1"><s0>12-0054343</s0></fA47><fA60><s1>P</s1><s2>C</s2></fA60><fA61><s0>A</s0></fA61><fA64 i1="01" i2="1"><s0>Microelectronic engineering</s0></fA64><fA66 i1="01"><s0>NLD</s0></fA66><fC01 i1="01" l="ENG"><s0>In this work the effect of the chemical treatment, argon sputtering and heating on the surface of indium tin oxide (ITO) on a Polyethylene Terephthalate (PET) substrate as well as the influence of the surface chemical pretreatment on the interface formation with Nickel Phthalocyanine (NiPc) was studied. The sample was characterized by X-ray and ultraviolet photoelectron spectroscopies (XPS, UPS) for the as-received specimen, after chemical treated ex-situ by a solution of methanol, isopropanol, H<sub>2</sub>O and by a H<sub>2</sub>O-H<sub>2</sub>O<sub>2</sub>-NH<sub>4</sub>OH solution. In addition, it was heated up to 110 °C and after a mild argon sputtering in ultra high vacuum (UHV). The electronic structure of the interface of Nickel Phthalocyanine with ITO/PET, which has been chemically treated, was investigated. The results show that the adsorbed carbon layer affects the interface energetics. No dipole formation was observed and the alignment of the energy levels at the interface is approaching the Schottky-Mott limit. They are compared with a previous study concerning the Nickel Phthalocyanine interfaced with sputtered clean ITO surface on glass.</s0></fC01><fC02 i1="01" i2="3"><s0>001B80A15C</s0></fC02><fC02 i1="02" i2="3"><s0>001B70I60J</s0></fC02><fC02 i1="03" i2="X"><s0>001D03F17</s0></fC02><fC02 i1="04" i2="3"><s0>001B80A05K</s0></fC02><fC03 i1="01" i2="3" l="FRE"><s0>Addition étain</s0><s5>01</s5></fC03><fC03 i1="01" i2="3" l="ENG"><s0>Tin additions</s0><s5>01</s5></fC03><fC03 i1="02" i2="3" l="FRE"><s0>Spectrométrie photoélectron</s0><s5>02</s5></fC03><fC03 i1="02" i2="3" l="ENG"><s0>Photoelectron spectroscopy</s0><s5>02</s5></fC03><fC03 i1="03" i2="3" l="FRE"><s0>Spectre photoélectron</s0><s5>03</s5></fC03><fC03 i1="03" i2="3" l="ENG"><s0>Photoelectron spectra</s0><s5>03</s5></fC03><fC03 i1="04" i2="3" l="FRE"><s0>Nettoyage surface</s0><s5>04</s5></fC03><fC03 i1="04" i2="3" l="ENG"><s0>Surface cleaning</s0><s5>04</s5></fC03><fC03 i1="05" i2="X" l="FRE"><s0>Prétraitement chimique</s0><s5>05</s5></fC03><fC03 i1="05" i2="X" l="ENG"><s0>Chemical pretreatment</s0><s5>05</s5></fC03><fC03 i1="05" i2="X" l="SPA"><s0>Pretratamiento químico</s0><s5>05</s5></fC03><fC03 i1="06" i2="X" l="FRE"><s0>Traitement chimique</s0><s5>06</s5></fC03><fC03 i1="06" i2="X" l="ENG"><s0>Chemical treatment</s0><s5>06</s5></fC03><fC03 i1="06" i2="X" l="SPA"><s0>Tratamiento químico</s0><s5>06</s5></fC03><fC03 i1="07" i2="3" l="FRE"><s0>Dépôt pulvérisation</s0><s5>07</s5></fC03><fC03 i1="07" i2="3" l="ENG"><s0>Sputter deposition</s0><s5>07</s5></fC03><fC03 i1="08" i2="3" l="FRE"><s0>Traitement thermique</s0><s5>08</s5></fC03><fC03 i1="08" i2="3" l="ENG"><s0>Heat treatments</s0><s5>08</s5></fC03><fC03 i1="09" i2="3" l="FRE"><s0>Spectre photoélectron UV</s0><s5>09</s5></fC03><fC03 i1="09" i2="3" l="ENG"><s0>Ultraviolet photoelectron spectra</s0><s5>09</s5></fC03><fC03 i1="10" i2="3" l="FRE"><s0>Spectre photoélectron RX</s0><s5>10</s5></fC03><fC03 i1="10" i2="3" l="ENG"><s0>X-ray 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i2="3" l="ENG"><s0>Energy levels</s0><s5>16</s5></fC03><fC03 i1="17" i2="3" l="FRE"><s0>Contamination superficielle</s0><s5>17</s5></fC03><fC03 i1="17" i2="3" l="ENG"><s0>Surface contamination</s0><s5>17</s5></fC03><fC03 i1="18" i2="3" l="FRE"><s0>Interface</s0><s5>22</s5></fC03><fC03 i1="18" i2="3" l="ENG"><s0>Interfaces</s0><s5>22</s5></fC03><fC03 i1="19" i2="X" l="FRE"><s0>Oxyde d'indium</s0><s5>23</s5></fC03><fC03 i1="19" i2="X" l="ENG"><s0>Indium oxide</s0><s5>23</s5></fC03><fC03 i1="19" i2="X" l="SPA"><s0>Indio óxido</s0><s5>23</s5></fC03><fC03 i1="20" i2="X" l="FRE"><s0>Ethylène téréphtalate polymère</s0><s2>NK</s2><s5>24</s5></fC03><fC03 i1="20" i2="X" l="ENG"><s0>Ethylene terephthalate polymer</s0><s2>NK</s2><s5>24</s5></fC03><fC03 i1="20" i2="X" l="SPA"><s0>Etileno tereftalato polímero</s0><s2>NK</s2><s5>24</s5></fC03><fC03 i1="21" i2="X" l="FRE"><s0>Phtalocyanine métallique</s0><s5>25</s5></fC03><fC03 i1="21" i2="X" l="ENG"><s0>Metallophthalocyanine</s0><s5>25</s5></fC03><fC03 i1="21" i2="X" l="SPA"><s0>Ftalocianina metálica</s0><s5>25</s5></fC03><fC03 i1="22" i2="3" l="FRE"><s0>Argon</s0><s2>NC</s2><s5>26</s5></fC03><fC03 i1="22" i2="3" l="ENG"><s0>Argon</s0><s2>NC</s2><s5>26</s5></fC03><fC03 i1="23" i2="3" l="FRE"><s0>Complexe de nickel</s0><s2>NK</s2><s5>27</s5></fC03><fC03 i1="23" i2="3" l="ENG"><s0>Nickel complexes</s0><s2>NK</s2><s5>27</s5></fC03><fC03 i1="24" i2="3" l="FRE"><s0>Méthanol</s0><s2>NK</s2><s5>28</s5></fC03><fC03 i1="24" i2="3" l="ENG"><s0>Methanol</s0><s2>NK</s2><s5>28</s5></fC03><fC03 i1="25" i2="X" l="FRE"><s0>Peroxyde d'hydrogène</s0><s2>NK</s2><s5>29</s5></fC03><fC03 i1="25" i2="X" l="ENG"><s0>Hydrogen peroxide</s0><s2>NK</s2><s5>29</s5></fC03><fC03 i1="25" i2="X" l="SPA"><s0>Peróxido de hydrogeno</s0><s2>NK</s2><s5>29</s5></fC03><fC03 i1="26" i2="3" l="FRE"><s0>Carbone</s0><s2>NC</s2><s5>30</s5></fC03><fC03 i1="26" i2="3" l="ENG"><s0>Carbon</s0><s2>NC</s2><s5>30</s5></fC03><fC03 i1="27" i2="3" l="FRE"><s0>Verre</s0><s5>31</s5></fC03><fC03 i1="27" i2="3" l="ENG"><s0>Glass</s0><s5>31</s5></fC03><fC03 i1="28" i2="3" l="FRE"><s0>Matériau dopé</s0><s5>46</s5></fC03><fC03 i1="28" i2="3" l="ENG"><s0>Doped materials</s0><s5>46</s5></fC03><fC03 i1="29" i2="X" l="FRE"><s0>Fabrication microélectronique</s0><s5>47</s5></fC03><fC03 i1="29" i2="X" l="ENG"><s0>Microelectronic fabrication</s0><s5>47</s5></fC03><fC03 i1="29" i2="X" l="SPA"><s0>Fabricación microeléctrica</s0><s5>47</s5></fC03><fC03 i1="30" i2="3" l="FRE"><s0>7960J</s0><s4>INC</s4><s5>56</s5></fC03><fC03 i1="31" i2="3" l="FRE"><s0>8105K</s0><s4>INC</s4><s5>57</s5></fC03><fC03 i1="32" i2="3" l="FRE"><s0>8540H</s0><s4>INC</s4><s5>58</s5></fC03><fC03 i1="33" i2="3" l="FRE"><s0>ITO</s0><s4>INC</s4><s5>82</s5></fC03><fC03 i1="34" i2="3" l="FRE"><s0>H2O2</s0><s4>INC</s4><s5>83</s5></fC03><fN21><s1>037</s1></fN21><fN44 i1="01"><s1>OTO</s1></fN44><fN82><s1>OTO</s1></fN82></pA><pR><fA30 i1="01" i2="1" l="ENG"><s1>Micro&Nano 2010 International Conference on Micro-Nanoelectronics, Nanotechnologies & MEMs</s1><s2>4</s2><s3>Athens GRC</s3><s4>2010-12-12</s4></fA30></pR></standard></inist></record>Pour manipuler ce document sous Unix (Dilib)
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